An Introduction to EUV Lithography, with a Focus on Interesting Control Challenges

ABSTRACT:
EUV (Extreme Ultraviolet) Lithography is the key enabler of the current semiconductor industry expansion. Driving shrink at each new node necessitates pushing the limits of science in many disciplines. A critical module of the EUV Lithography system is the EUV Source – the “light bulb”. This presentation will provide a high level overview of the EUV Source and will focus on a number of interesting control challenges associated with achieving high spatial and temporal precision.

BIOGRAPHY:
Sam Crisafulli is the Sr. Director of Development and Engineering for ASML in San Diego. He is the Head of Department for EUV Source Plasma, Optics and Metrology in addition to the System Function Owner for EUV Source Plasma Generation and Energy Control. His role spans many disciplines including Plasma and Laser physics, Dynamics and Control, Modelling and Simulation, Optics, Measurement and Advanced Data Analytics. He has a BE in Electrical and Electronics Engineering from James Cook University, Australia and a PhD in Systems (Control) Engineering from the Australian National University.